Xiamen Powerway Advanced Material Co.,Ltd., a leading supplier of AlGaAs layer and other related products and services announced the new availability of size 2”-3” is on mass production in 2017. This new product represents a natural addition to PAM-XIAMEN’s product line.
Dr. Shaka, said, “We are pleased to offer AlGaAs layer to our customers including many who are developing better and more reliable for GaAs-based red- and near-infra-red-emitting (700 nm-1100 nm) double-hetero-structure laser diodes. Our AlGaAs layer has excellent properties, it’s used as a barrier material in GaAs based heterostructure devices. The AlGaAs layer confines the electrons to a gallium arsenide region. An example of such a device is a quantum well infrared photodetector (QWIP). The availability improve boule growth and wafering processes.” and “Our customers can now benefit from the increased device yield expected when developing advanced transistors on a square substrate. Our AlGaAs layer are natural by products of our ongoing efforts, currently we are devoted to continuously develop more reliable products.”
PAM-XIAMEN’s improved AlGaAs product line has benefited from strong tech. support from Native University and Laboratory Center.
Now it shows an example as follows:
3” AlGaAs/GaAs/AlGaAs on GaAs substrate
thickness of each epilayer 1μm
dopant density for GaAs layer 10^17-10^18 /cm3
Al_xGa_1-xAs stoichiometry x~0.3
About Xiamen Powerway Advanced Material Co., Ltd
Found in 1990, Xiamen Powerway Advanced Material Co., Ltd (PAM-XIAMEN) is a leading manufacturer of compound semiconductor material in China. PAM-XIAMEN develops advanced crystal growth and epitaxy technologies, manufacturing processes, engineered substrates and semiconductor devices. PAM-XIAMEN’s technologies enable higher performance and lower cost manufacturing of semiconductor wafer.
Aluminium gallium arsenide (also gallium aluminium arsenide) (AlxGa1−xAs) is a semiconductor material with very nearly the same lattice constant as GaAs, but a larger bandgap. The x in the formula above is a number between 0 and 1 – this indicates an arbitrary alloy between GaAs and AlAs. The formula AlGaAs should be considered an abbreviated form of the above, rather than any particular ratio. The bandgap varies between 1.42 eV (GaAs) and 2.16 eV (AlAs). For x < 0.4, the bandgap is direct. The refractive index is related with the bandgap via the Kramers–Kronig relations and varies between 2.9 (x = 1) and 3.5 (x = 0). This allows the construction of Bragg mirrors used in VCSELs and RCLEDs.
Q: I”m looking for some GaAs wafers with a custom epilayer stack of AlGaAs/GaAs/AlGaAs grown on top 2” and 3″ wafers with each epilayer having a thickness of order 1 micron Si-doped at Na in the range 10^17-10^18 /cm3 for both the GaAs and barrier layers, with Al_xGa_1-xAs stoichiometry x~0.3
A: Yes, it could be supplied
Q: The quote you gave us was for a 220nm layer of GaAs on top with a 2µm thick Al_0.7 Ga_0.3 As layer.We are now interested in purchasing a 250nm GaAs layer on top of a 3µm thick Al_0.7 Ga_0.3 As layer.Would you be able to manufacture such wafers?
A: Yes, we could supply both of above wafers.
For more information, please visit our website: https://www.powerwaywafer.com, send us email at email@example.com firstname.lastname@example.org.