CeO2 Epi Film on YSZ

PAM XIAMEN offers CeO2 Epi Film on YSZ.

CeO2 Film (40 nm one side) on YSZ <100> 10x10x0.5 mm

Epitaxial thin Film Composition <100>  CeO2
Epitaxial Film Thickness 40 nm +/- 10 nm
Growth method Spin coating
Epitaxial FWHM < 5 
Substrate <100>, YSZ, 10x10x0.5 mm, one side polished

 

CeO2 Film (40 nm one side) on YSZ <110> 10x10x0.5 mm.

Epitaxial thin Film Composition <110>  CeO2
Epitaxial Film Thickness 40 nm +/- 10 nm
Epitaxial FWHM < 5 
Substrate <100>, YSZ, 10x10x0.5 mm, one side polished

 

CeO2 Film (40 nm one side) on YSZ, <111>10x10x0.5 mm, 1sp

Epitaxial thin Film Composition <111> CeO2
Epitaxial Film Thickness 40 nm +/- 10 nm
Epitaxial FWHM < 5 o   +/- 1o
Substrate <111>, YSZ, 10x10x0.5 mm, one side polished

For more information, please visit our website: https://www.powerwaywafer.com,
send us email at sales@powerwaywafer.com and powerwaymaterial@gmail.com

Found in 1990, Xiamen Powerway Advanced Material Co., Ltd (PAM-XIAMEN) is a leading manufacturer of semiconductor material in China. PAM-XIAMEN develops advanced crystal growth and epitaxy technologies, manufacturing processes, engineered substrates and semiconductor devices. PAM-XIAMEN’s technologies enable higher performance and lower cost manufacturing of semiconductor wafer.

Our goal is to meet all of your requirements, no matter how small orders and how difficult questions they may be,
to maintain sustained and profitable growth for every customer through our qualified products and satisfying service.

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