Characterization of LT GaAs carrier lifetime in multilayer GaAs epitaxial wafers by the transient reflectivity technique

Characterization of LT GaAs carrier lifetime in multilayer GaAs epitaxial wafers by the transient reflectivity technique

A methodology for determining the carrier lifetime of LT GaAs buffer layers in GaAs multilayer wafers utilizing the femtosecond transient reflectivity technique is introduced. Experimental results and computer simulations performed as a function of the LT GaAs growth temperature are presented for the multilayer GaAs structures that are used for device fabrication. The markedly non-exponential nature of the measured transients is a consequence of the multilayer structure of the wafers. The carrier lifetime measurements are correlated with available SEU data measured for structures fabricated with LT GaAsbuffers with different growth temperatures

Source:IEEE

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2014-03-14 LT-GaAs

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