Chrome Photomask

Chrome Photomask

Chrome photomask is available for transferring high-precision circuit design. The photomask is the pattern film in the chip manufacturing process, and is one of the determined factors for chip accuracy and quality. More specifications please see as follows:

Chrome Photomask

No.1 5 inch Chrome Mask Plate (PAM180119-MASKW)

Material Soda Lime Mask Blanks
Size 5 inch
Thickness ~0.06 inch
Glass Flatness ≤15 µm
Mask Plate Flatness ≤15 µm
Glass Defect DDPSI for 0.5µm < 1.0 PSI
Substrate Defect DDPSI for 1.0 µm (Visible)
Pre-coat Pre coated with positive Photoresist ~500nm thick (variation <10%)     
Pre-bake Pre-baked and compatible with 405 nm laser beam
Cr- Thickness 100nm, Variation < 10%
Cr Coating Reflectivity 11.0 ± 3.0 @ 436nm
Cr coating Optical Density 3 ± 0.2 @ 450nm
Pin hole density ≤1PSI     

 

No.2 Photomask (PAM180904-MASKW)

i. Dimension(WxHxThickness): Square 5″ x 5″ x .090″
ii. Substrate: Quartz
iii. Coating: Antireflective Chrome
iv. Minimum feature /Critical Dimension (CD): 1 um+/-0.1 um

No.3 Chrome on quartz or sodalime (PAM200303-MASKW) 

Photomask; 4″ x 4″ x 0.090″, 1 micron min feature size, chrome on quartz
Photomask; 4″ x 4″ x 0.090″, 5 micron min feature size, chrome on soda lime

No.4 Chrome photo mask (PAM200426-MASKW)

3” chrome photomask blanks
Chrome coating approx. 100-110 nm thickness
Soda lime material (substrate), 1.5mm thickness plate
Photoresist AZ 1500 series positive photoresist sensitive to 365 nm wavelength

4” & 5” chrome photomask blanks
Chrome coating approx 100-110 nm thickness
Soda lime material (substrate), 2.2mm thickness plate
Photoresist AZ 1500 series positive photoresist sensitive to 365 nm wavelength

No.5 Chrome Photomask (PAM190410-MASKW) 

Chrome photomask (126mm x 126 mm, with pattern). Resolution of 20um should be good enough. All dimensions can be rounded up to 20um.
The mask will be used for photolithography on a 4” wafer.

No.6 Fused silica photomask substrate (PAM201216-MASKW)

9” (225x225mm) Quartz photomask
min seam/ linewidth: 2um
precision on seam: ±0.3um

The photomask is mainly divided into two components, namely the substrate and the opaque material. The opaque material of different masks is different. Usually, it takes the quartz glass with high purity, low thermal expansion coefficient and low reflectivity as substrate. The photomask is divided into chrome plate (soda glass, quartz glass, borosilicate glass), dry plate, film, and relief plate (APR). The opaque layer of the chrome plate is a chrome layer with a thickness of 0.1um, which is sputtered under the glass.

For more information, please contact us email at [email protected] and [email protected].

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