InP wafer

InAs wafer InAs wafer
InP wafer
InP wafer
InP wafer
InP wafer

InP wafer

PAM-XIAMEN offers InP wafer – Indium Phosphide which are grown by LEC(Liquid Encapsulated Czochralski) or VGF(Vertical Gradient Freeze) as epi-ready or mechanical grade with n type, p type or semi-insulating in different orientation(111)or(100).

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  • Description

Product Description

PAM-XIAMEN offers InP wafer – Indium Phosphide which are grown by LEC(Liquid Encapsulated Czochralski) or VGF(Vertical Gradient Freeze) as epi-ready or mechanical grade with n type, p type or semi-insulating in different orientation(111)or(100).

Indium phosphide (InP) is a binary semiconductor composed of indium and phosphorus. It has a face-centered cubic (“zinc blende”) crystal structure, identical to that of GaAs and most of the III-V semiconductors.Indium phosphide can be prepared from the reaction of white phosphorus and indium iodide[clarification needed] at 400 °C.,[5] also by direct combination of the purified elements at high temperature and pressure, or by thermal decomposition of a mixture of a trialkyl indium compound and phosphide. InP is used in high-power and high-frequency electronics[citation needed] because of its superior electron velocity with respect to the more common semiconductors silicon and gallium arsenide.

Here is the detail specification:
2″(50.8mm)InP Wafer Specification
3″(76.2mm)Inp Wafer Specification
4″(100mm) InP Wafer Specificatio
2″ InP Wafer Specification
Item Specifications
Dopant N-type N-type P-type SI-type
Conduction Type Undoped Sulphur Zinc lron
Wafer Diameter 2″
Wafer Orientation (100)±0.5°
Wafer Thickness 350±25um
Primary Flat Length 16±2mm
Secondary Flat Length 8±1mm
Carrier Concentration 3×1016cm-3 (0.8-6)x1018cm-3 (0.6-6)x1018cm-3 N/A
Mobility (3.5-4)x103cm2/V.s (1.5-3.5)x103cm2/V.s 50-70×103cm2/V.s >1000cm2/V.s
Resistivity N/A N/A N/A N/A
EPD <1000cm-2 <500cm-2 <1×103cm-2 <5×103cm-2
TTV <10um
BOW <10um
WARP <12um
Laser marking upon request
Suface finish P/E, P/P
Epi ready yes
Package Single wafer container or cassette

 


3″ InP Wafer Specification 

 

Item Specifications
Dopant N-type N-type P-type SI-type
Conduction Type Undoped Sulphur Zinc lron
Wafer Diameter 3″
Wafer Orientation (100)±0.5°
Wafer Thickness 600±25um
Primary Flat Length 16±2mm
Secondary Flat Length 8±1mm
Carrier Concentration ≤3×1016cm-3 (0.8-6)x1018cm-3 (0.6-6)x1018cm-3 N/A
Mobility (3.5-4)x103cm2/V.s (1.5-3.5)x103cm2/V.s 50-70×103cm2/V.s >1000cm2/V.s
Resistivity N/A N/A N/A N/A
EPD <1000cm-2 <500cm-2 <1×103cm-2 <5×103cm-2
TTV <12um
BOW <12um
WARP <15um
Laser marking upon request
Suface finish P/E, P/P
Epi ready yes
Package Single wafer container or cassette

 

 4″ InP Wafer Specification 
Item Specifications
Dopant N-type N-type P-type SI-type
Conduction Type Undoped Sulphur Zinc lron
Wafer Diameter 4″
Wafer Orientation (100)±0.5°
Wafer Thickness 600±25um
Primary Flat Length 16±2mm
Secondary Flat Length 8±1mm
Carrier Concentration ≤3×1016cm-3 (0.8-6)x1018cm-3 (0.6-6)x1018cm-3 N/A
Mobility (3.5-4)x103cm2/V.s (1.5-3.5)x103cm2/V.s 50-70×103cm2/V.s >1000cm2/V.s
Resistivity N/A N/A N/A N/A
EPD <1000cm-2 <500cm-2 <1×103cm-2 <5×103cm-2
TTV <15um
BOW <15um
WARP <15um
Laser marking upon request
Suface finish P/E, P/P
Epi ready yes
Package Single wafer container or cassette

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