FE SRTIO3 IRON DOPED STRONTIUM TITANATE CRYSTAL SUBSTRATES FE CONCENTRATION 0.05 WT%

PAM XIAMEN offers Fe SrTiO3 Iron Doped Strontium Titanate Crystal Substrates.

Single crystal SrTiO3 doped with 0.05 wt%  Fe
Specifications:
Crystal Structure:Cubic
Growth Method:Vernuil Method
Lattice Parameter:a=3.905Å
Fe Doping Concentrations:0.05%
Melting Point:2080C
Density:5.122 g/ccm
Hardness:6-6.5 Mohs
Thermal expansion:10.3 x 10^-6/K
Dielectric Constant:5.2
Dielectric Loss: ~5×10^-4(300K) ~3×10^-4(77K)
Sizes Available:10×3m、10×5m、10×10mm、15×15mm、20×15mm can be customized upon request
Typical thickness:0.5mm or 1.0mm
Orientations:<100>、<110>、<111>
Miscut:0.5 degree
Surface Polishing:single or double side polished (SSP or DSP), epi-ready, < 5 A (5 um x 5 um) by AFM

For more information, please visit our website: https://www.powerwaywafer.com,
send us email at sales@powerwaywafer.com and powerwaymaterial@gmail.com

Found in 1990, Xiamen Powerway Advanced Material Co., Ltd (PAM-XIAMEN) is a leading manufacturer of semiconductor material in China. PAM-XIAMEN develops advanced crystal growth and epitaxy technologies, manufacturing processes, engineered substrates and semiconductor devices. PAM-XIAMEN’s technologies enable higher performance and lower cost manufacturing of semiconductor wafer.

PAM-XIAMEN develops advanced crystal growth and epitaxy technologies, range from the first generation Germanium wafer, second generation Gallium Arsenide with substrate growth and epitaxy on III-V silicon doped n-type semiconductor materials based on Ga, Al, In, As and P grown by MBE or MOCVD, to the third generation: Silicon carbide and Gallium Nitride for LED and power device application.

Share this post