絶縁体上のLN薄膜

絶縁体上のLN薄膜

ニオブ酸リチウム（LN）Insulato上に薄膜r

単結晶ニオブ酸リチウム（LN）フィルムは、ニオブ酸リチウム基板上に集積することができます。 構造は、電気光学変調器、光導波路、共振器、SAWデバイス、FRAMメモリデバイス、等に使用することができます

単結晶ニオブ酸リチウム薄膜は、フォトニック回路、高速、広い帯域幅、高密度、高効率での電子機器の開発のために非常に重要です。

サイズ：3インチ

厚さ：300〜700nmの

オリエンテーション：Xカット、Yカット、Zカット

構造は以下の通りです：

リチウムNioboate薄膜

SiO2

ニオブ酸リチウム基板

2018-08-22

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