I am not sure whether practically LLO can be done on the PSS given it is not a flat surface

Q: I am not sure whether practically LLO can be done on the PSS given it is not a flat surface

A: “laser lift-off” actually is according to “NL layer” as below image. If the NL layer is GaN layer, when it is heating to constant high temperature, the GaN is decomposed into Ga and nitrogen, and nitrogen is released out, naturally the sapphire is seperated from epitaxial layer.So the main point is if the NL layer is GaN layer or not (some manufacturers use NL layer by AlN material, if so, it can not be laser lift off.)And we confirm our NL layer is GaN material.

2018-06-19

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PAM-XIAMEN can offer float zone silicon wafer, which is obtained by Float Zone method. Monocrystalline silicon rods is got through float zone growth, and then process the monocrystalline silicon rods into silicon wafers, called float zone silicon wafers. Since the zone-melted silicon wafer is not in contact with the quartz crucible during the floating zone silicon process, the silicon material is in a suspended state. Thereby, it is less polluted during the process of floating zone melting of silicon. The carbon content and oxygen content are lower, the impurities are less, and the resistivity is higher. It is suitable for the manufacture of power devices and certain high-voltage electronic devices.
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Read More
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I am not sure whether practically LLO can be done on the PSS given it is not a flat surface

I am not sure whether practically LLO can be done on the PSS given it is not a flat surface

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