X-ray diffraction analysis of LT-GaAs multilayer structures

X-ray diffraction analysis of LT-GaAs multilayer structures
Multilayer structures of low-temperature-grown GaAs(LT-GaAs) into which ultra-thin layers containing excess As are periodically introduced are grown by molecular beam epitaxy. The concentration of excess As in the ultra-thin layers is determined by the analysis of the intensity of a satellite reflection of the multilayer structure along with a peak shift of the 400 Bragg reflection from that of the GaAs substrate. The analysis shows that the concentration of excess As in the ultra-thin layers is significantly higher than those of thick LT-GaAs layers grown under the identical condition of the fluxes and the substrate temperature.
 
Fig. 1. Model of one period of the LT-GaAs multilayer structure.
Source: Journal of Crystal Growth
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