Gan berasaskan LED Epitaxial Wafer
Gan PAM-XIAMEN-kanak (galium nitrida) berasaskan LED wafer epitaxial adalah untuk tinggi kecerahan diod ultra biru dan hijau pemancar cahaya (LED) dan diod laser (LD) permohonan.
- Penerangan
Penerangan Produk
The LED epitaxial wafer is a substrate heated to an appropriate temperature. The LED wafer material is the cornerstone of the technology development for the semiconductor lighting industry. Different substrate materials require different LED epitaxial wafer growth technology, chip processing technology and device packaging technology. The substrate for LED epi wafer determines the development route of semiconductor lighting technology. To achieve luminous efficiency, epitaxial wafer suppliers pay more attention to GaN based LED epitaxial wafer, since the epitaxial wafer price is in low cost, and the epi wafer defect density is small. LED epi wafer advantage on GaN substrate is the realization of high efficiency, large area, single lamp and high power, which make the process technology simplify and improve the large yield rate. The development prospects of the LED epi wafer market are optimistic.
1. LED Wafer List
|
LED Epitaxial Wafer |
||||||||
| Perkara | Size | orientasi | Emission | Wavelength | Thickness | substrat | permukaan | Usable area |
| PAM-50-LED-BLUE-F | 50mm | 0°±0.5° | blue light | 445-475nm | 425um+/-25um | Sapphire | P/L | >90% |
| PAM-50-LED-BLUE-PSS | 50mm | 0°±0.5° | blue light | 445-475nm | 425um+/-25um | Sapphire | P/L | >90% |
| PAM-100-LED-BLUE-F | 100mm | 0°±0.5° | blue light | 445-475nm | / | Sapphire | P/L | >90% |
| PAM-100-LED-BLUE-PSS | 100mm | 0°±0.5° | blue light | 445-475nm | / | Sapphire | P/L | >90% |
| PAM-150-LED-BLUE | 150mm | 0°±0.5° | blue light | 445-475nm | / | Sapphire | P/L | >90% |
| PAM-100-LED-BLUE-SIL | 50mm | 0°±0.5° | blue light | 445-475nm | / | Silicon | P/L | >90% |
| PAM-100-LED-BLUE-SIL | 100mm | 0°±0.5° | blue light | 445-475nm | / | Silicon | P/L | >90% |
| PAM-150-LED-BLUE-SIL | 150mm | 0°±0.5° | blue light | 445-475nm | / | Silicon | P/L | >90% |
| PAM-200-LED-BLUE-SIL | 200mm | 0°±0.5° | blue light | 445-475nm | / | Silicon | P/L | >90% |
| PAM-50-LED-GREEN-F | 50mm | 0°±0.5° | green light | 510-530nm | 425um+/-25um | Sapphire | P/L | >90% |
| PAM-50-LED-GREEN-PSS | 50mm | 0°±0.5° | green light | 510-530nm | 425um+/-25um | Sapphire | P/L | >90% |
| PAM-100-LED-GREEN-F | 100mm | 0°±0.5° | green light | 510-530nm | / | Sapphire | P/L | >90% |
| PAM-100-LED-GREEN-PSS | 100mm | 0°±0.5° | green light | 510-530nm | / | Sapphire | P/L | >90% |
| PAM-150-LED-GREEN | 150mm | 0°±0.5° | green light | 510-530nm | / | Sapphire | P/L | >90% |
| PAM-100-LED-RED-GAAS-620 | 100mm | 15°±0.5° | red light | 610-630nm | / | GaAs | P/L | >90% |
| PAM210527-LED-660 | 100mm | 15°±0.5° | red light | 660nm | / | GaAs | P/L | >90% |
| PAM-210414-850nm-LED | 100mm | 15°±0.5° | IR | 850nm | / | GaAs | P/L | >90% |
| PAMP21138-940LED | 100mm | 15°±0.5° | IR | 940nm | / | GaAs | P/L | >90% |
| PAM-50-LED-UV-365-PSS | 50mm | 0°±0.5° | UVA | 365 nm | 425um+/-25um | Sapphire | ||
| PAM-50-LED-UV-405-PSS | 50mm | 0°±0.5° | UVA | 405 nm | 425um+/-25um | Sapphire | ||
| PAM-50-LED-UVC-275-PSS | 50mm | 0°±0.5° | UVC | 275nm | 425um+/-25um | Sapphire | ||
| PAM-50-LD-UV-405-SIL | 50mm | 0°±0.5° | UV | 405nm | / | Silicon | P/L | >90% |
| PAM-50-LD-BLUE-450-SIL | 50mm | 0°±0.5° | blue light | 450nm | / | Silicon | P/L | >90% |
As a LED epitaxial wafer manufacturer, PAM-XIAMEN can offer activated and unactivated GaN Epi LED wafer for LED and laser diodes (LD) application,such as For micro LED or ultra thin wafer or UV LED researches or LED manufacturers. LED epitaxial wafer on GaN is grown by MOCVD with PSS or flat sapphire for LCD back light, mobile, electronic or UV(ultraviolet), with blue or green or red emission, including InGaN/GaN active area and AlGaN layers with GaN well/AlGaN barrier for different chip sizes.
2. InGaN/Gan(gallium nitride) based LED Epitaxial Wafer
Gan pada Al2O3-2 "epi wafer Spesifikasi (LED Epitaxial wafer)
| White： 445～460 nm |
| Blue： 465～475 nm |
| Green： 510～530 nm |
Teknik 1. Pertumbuhan - MOCVD
2.Wafer diameter: 50.8mm
3.Wafer substrate material: Patterned Sapphire Substrate(Al2O3) or Flat Sapphire
4.Wafer saiz corak: 3X2X1.5μm
3. Wafer structure:
| lapisan struktur | Thickness(μm) |
| p-Gan | 0.2 |
| p-AlGaN | 0.03 |
| InGaN / Gan (kawasan aktif) | 0.2 |
| n-Gan | 2.5 |
| u- Gan | 3.5 |
| Al2O3 (substrat) | 430 |
4. Wafer parameters to make chips:
| em | Warna | Saiz cip | Ciri-ciri | rupa | |
| PAM1023A01 | Blue | 10mil x 23mil |  |
lampu | |
| Vf = 2.8 ~ 3.4V | latar LCD | ||||
| Po = 18 ~ 25MW | peralatan mudah alih | ||||
| Wd = 450 ~ 460nm | elektronik pengguna | ||||
| PAM454501 | Blue | 45mil x 45mil | Vf = 2.8 ~ 3.4V |  |
pencahayaan umum |
| Po = 250 ~ 300MW | latar LCD | ||||
| Wd = 450 ~ 460nm | paparan luar |
5. Application of LED epitaixal wafer:
*If you need to know more detail information of Blue LED Epitaxial Wafer, please contact with our sales departments
lampu
lampu belakang LCD
peralatan mudah alih
elektronik pengguna
6. Specification of LED Epi Wafer as an example:
Spec PAM190730-LED
– size : 4 inch
– WD : 455 ± 10nm
– brightness : > 90mcd
– VF : < 3.3V
– n-GaN Thickness : <4.1㎛
– u-GaN thickness : <2.2㎛
– substrate : patterned sapphire substrate (PSS)
7.GaAs(Gallium arsenide)based LED Wafer Material:
Mengenai GaAs wafer LED, mereka ditanam oleh MOCVD, lihat di bawah panjang gelombang GaAs LED wafer:
Merah: 585nm, 615nm, 620 ~ 630nm
Yellow:587 ~ 592nm
Yellow/Green: 568 ~ 573nm
8. Definition of LED Epitaxial Wafer:
What we offer is bare LED epi wafer or not processed wafer without lithography processes, n- and metals contacts, etc. And you can fabricate the LED chip using your fabrication equipment for different application such as nano optoelectronics research.
Untuk ini GaAs detail LED ciri-ciri komputer wafer, sila layari:GaAs Epi Wafer bagi LED
Untuk UV LED ciri-ciri komputer wafer, sila layari:UV LED Epi Wafer
Untuk wafer LED pada ciri-ciri komputer silikon, sila layari:LED Wafer di Silicon
Untuk ciri-ciri komputer Blue Gan LD Wafer, sila layari: Blue Gan LD Wafer
For Violet GaN LD Wafer, please visit: Wafer Diod Laser GaN 405nm
850nm and 940nm infrared LED wafer
850-880nm and 890-910nm Red Infrared AlGaAs /GaAs LED Epi-Wafer
GaN Wafers to Fabricate LED Devices
GaN LED Structure Epitaxy on Flat or PSS Sapphire Substrate
GaN Epitaxial Growth on Sapphire for LED
Formation of V-Shaped Pits in Nitride Films Grown by Metalorganic Chemical Vapor Deposition
Si-based GaN PIN Photodetector Structure
For more foundry services, please visit: Perkhidmatan Faundri GaN untuk Fabrikasi LED
You may also like…
-
Freestanding Gan substrat
PAM-XIAMEN telah menubuhkan teknologi pembuatan untuk berdiri sendiri (galium nitrida) wafer Gan substrat, yang adalah untuk UHB-LED dan LD. Berkembang dengan teknologi hidrida fasa wap epitaxy (HVPE), substrat Gan kami mempunyai ketumpatan kecacatan rendah.
-
Templat Gan
PAM-XIAMEN-kanak Produk Template terdiri daripada lapisan kristal (galium nitrida) template Gan, (aluminium nitrida) template AlN, (aluminium galium nitrida) template AlGaN dan (indium galium nitrida) template InGaN, yang disimpan di nilam -
GaAs Epiwafer
PAM-XIAMEN mengeluarkan pelbagai jenis bahan semikonduktor jenis-n doped epi wafer III-V silikon berasaskan Ga, Al, In, As dan P yang ditanam oleh MBE atau MOCVD. Kami membekalkan struktur epiwafer GaAs tersuai untuk memenuhi spesifikasi pelanggan, sila hubungi kami untuk mendapatkan maklumat lanjut.
-
Cz Mono-Kristal Silicon
PAM-XIAMEN, a monocrystalline bulk silicon producer, can offer <100>, <110> and <111> monocrystalline silicon wafers with N&P dopant in 76.2~200 mm, which are grown by CZ method. The Czochralski method is a crystal growth method, referred to as the CZ method. It is integrated in a straight-tube heat system, heated by graphite resistance, melts the polysilicon contained in a high-purity quartz crucible, and then inserts the seed crystal into the surface of the melt for welding. After that, the rotating seed crystal is lowered and melted. The body is infiltrated and touched, gradually raised, and finished or pulled through the steps of necking, necking, shouldering, equal diameter control, and finishing.
-
SiC Wafer Substrat
Syarikat itu mempunyai barisan pengeluaran substrat wafer SiC(silikon karbida) lengkap yang menyepadukan pertumbuhan kristal, pemprosesan kristal, pemprosesan wafer, penggilap, pembersihan dan ujian. Pada masa kini kami membekalkan wafer SiC 4H dan 6H komersial dengan separa penebat dan kekonduksian dalam paksi atas atau luar paksi, saiz tersedia: 5x5mm2,10x10mm2, 2",3",4" dan 6", menembusi teknologi utama seperti penindasan kecacatan , pemprosesan kristal benih dan pertumbuhan pesat, menggalakkan penyelidikan dan pembangunan asas berkaitan epitaksi silikon karbida, peranti, dsb.
-
Gan HEMT Epitaxial Wafer
Gallium Nitride (GaN) HEMTs (High Electron Mobility Transistors) are the next generation of RF power transistor technology. Thanks to GaN technology, PAM-XIAMEN now offer AlGaN/GaN HEMT Epi Wafer on sapphire or Silicon, and AlGaN/GaN on sapphire template.
-
wafer INSB
PAM-XIAMEN offers Compound Semiconductor InSb wafer – Indium antimonide wafer which is grown by LEC(Liquid Encapsulated Czochralski) as epi-ready or mechanical grade with n type, p type or semi-insulating in different orientation(111) or (100). Indium antimonide doped with isoelectronic(such as N doping) can reduce the defect density during the indium antimonide thin films manufacturing process.
-
Ge (Germanium) kristal tunggal dan Wafers
PAM-XIAMEN menawarkan wafer germanium 2", 3", 4" dan 6", yang merupakan singkatan untuk wafer Ge yang ditanam oleh VGF / LEC. Wafer Germanium jenis P dan N yang didop ringan boleh juga digunakan untuk eksperimen kesan Hall. Pada suhu bilik, germanium kristal rapuh dan mempunyai keplastikan yang sedikit. Germanium mempunyai sifat semikonduktor. germanium ketulenan tinggi didopkan dengan unsur trivalen (seperti indium, galium, boron) untuk mendapatkan semikonduktor germanium jenis P; dan unsur pentavalen (seperti antimoni, arsenik, dan fosforus) didopkan untuk mendapatkan semikonduktor germanium jenis N. Germanium mempunyai sifat semikonduktor yang baik, seperti mobiliti elektron tinggi dan mobiliti lubang tinggi.
