Photomask Large Size

PAM XIAMEN offers Large Size Photomask.

Chromium plate accuracy (Standard Size:430mmx430mm)

Accuracy/Grade Max Accuracy High-precision Medium accuracy General accuracy
Min.Line/Space Width 0.75μm/0.75μm 5μm/5μm 10μm/10μm 20μm/20μm
CD Control ±0.15μm(QZ) ±0.5μm ±1.0μm ±2.0μm
Total Pitch Accuracy ±0.5μm(QZ) ±1.0μm ±2.0μm ±2.0μm
Registration Accuracy ±0.5μm(QZ) ±1.0μm ±2.0μm ±3.0μm
Overlay Accuracy ±0.5μm(QZ) ±1.0μm ±2.0μm ±3.0μm
Orthogonality ±0.75μrad ±2.0μrad ±3.0μrad ±4.0μrad

 

Chrome plate material (Photomask blank plate)

Material SodaLimeGlass、Quartz
Max. Size 850mm*1400mm
Normal Size 420mmx520mm,520mm*610mm,520mm*800mm,700mm*800mm,
800mm*920mm,800mm*960mm,850mm*1200mm,850mm*1400mm
Thickness 2.3±0.2mm,3.0±0.2mm,4.8±0.2mm,7.8±0.2mm,
5.0±0.2mm(QZ),8.0±0.2mm(QZ),10.0±0.2mm(QZ)
Film Type LowReflectanceChrome
Optical Density
(λ=450nm)
BetweenPlates3.0±0.3InPlate±0.3
Reflectivity
(λ=436nm)
BetweenPlates10±5%InPlate±2%

 

Main application areas:
1、LCD, TFT, CF, TouchPanel, OLED, PDP and other flat panel display industries
2、HDI, FPC and other PCB industries.

For more information, please visit our website: https://www.powerwaywafer.com,
send us email at sales@powerwaywafer.com and powerwaymaterial@gmail.com

Found in 1990, Xiamen Powerway Advanced Material Co., Ltd (PAM-XIAMEN) is a leading manufacturer of semiconductor material in China. PAM-XIAMEN develops advanced crystal growth and epitaxy technologies, manufacturing processes, engineered substrates and semiconductor devices. PAM-XIAMEN’s technologies enable higher performance and lower cost manufacturing of semiconductor wafer.

Our goal is to meet all of your requirements, no matter how small orders and how difficult questions they may be, to maintain sustained and profitable growth for every customer through our qualified products and satisfying service.

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