Product Tag - Float Zone Process

  • Float-Zone Mono-Crystalline Silicon

    Float-Zone Mono-Crystalline Silicon

    FZ-Silicon

    The mono-crystalline silicon with the characteristics of low foreign-material content, low defect density and perfect crystal structure is produced with the float-zone process; no foreign material is introduced during the crystal growth. The FZ-Silicon conductivity is usually above 1000 Ω-cm, and the FZ-Silicon is mainly used to produce the high inverse-voltage elements and photoelectronic devices.