High Voltage Power Supply

PAMDPU-1000-01 is a direct current power supply unit in low ripple, low thermal drift and long- term stability. It can supply power to probe in nuclear detection field and others. 1. High Voltage Power Supply Specification Input AC220V/50Hz Output HV DC 0~500V/0~1000V;         LV DC +12V/2W、-12V/1W Alternative current 2A Ripple voltage 10ppm (at rated voltage output) The voltage display Accuracy = [...]

Структура солнечного элемента, эпитаксиально выращенная на пластине InP

InP epitaxial wafers with solar cell structure that a p-InGaAs lattice matched to n-InP substrate can be provided by PAM-XIAMEN. Indium phosphide is one of the main group III-V compound semiconductors for manufacturing multi-compound solar cells. These multi-compound solar cells mainly include GaAs, InP, GaInP, AlGaInP, InGaAs, GaInNAs, CuInSe2, [...]

Удельное сопротивление германия, измеренное линейным четырехточечным датчиком постоянного тока - критерий

The single crystal germanium is n type at room temperature, and the resistivity shows non-single dependence on temperature. When conduction type transits from n type to p type, the bulk germanium resistivity is in maximum, and the carrier mobility is declining. With the increasing of dopant concentration, the transition [...]

Фотолитографическая маска

Photolithography chrome masks are for sale. According to the different substrate materials, it can be divided into quartz mask, soda mask and others (including relief plate, film), etc. Among them, the photomask on quartz substrate and soda lime are commonly used lithography masks in universities and research institutes. More [...]

Заготовка для фотошаблона хрома

Photomask blank with antireflective chromium is available. Photomasks are mainly used in integrated circuits, flat panel displays (including LCD, LED, OLED), printed circuit boards and other fields. The photomask is a pattern master used in the photolithography process in microelectronics manufacturing. Here are specifications of photo mask blank for [...]

Хром фотошаблоны

Chrome photomask is available for transferring high-precision circuit design. The photomask is the pattern film in the chip manufacturing process, and is one of the determined factors for chip accuracy and quality. More specifications please see as follows: No.1 5 inch Chrome Mask Plate (PAM180119-MASKW) Material Soda Lime Mask Blanks Size 5 inch Thickness ~0.06 inch Glass [...]

Si MEMS Wafer, выращенная FZ

FZ grown high-resistance silicon wafer is offered by PAM-XIAMEN for the fabrication of MEMS (Micro-electro Mechanical System). Silicon wafer is the common material for manufacturing integrated circuits in consumer electronics. Due to the availability and competitive price with high quality of silicon material, it is very attractive for MEMS [...]

Метод определения плотности дислокаций монокристаллического германия

This standard specifies the test method for the dislocation density of germanium single crystal. This standard method is applicable to the measurement of dislocation density of monocrystal germanium on {111), {100} and {113} planes. The test range is 0cm-2~100000cm-2. 1. Normative Document Citation for Determining Monocrystalline Germanium Dislocation Density The following [...]