Silicon Wafer Si wafer Substrate -Silicon Quantity Material Orientation. Diameter Thickness Polish Resistivity Type Dopant Nc Mobility EPD PCS (mm) (μm) Ω·cm a/cm3 cm2/Vs /cm2 1-100 Si N/A 25.4 280 SSP 1-100 P/b N/A N/A N/A 1-100 Si N/A 25.4 280 SSP 1-100 P/b (1-200)E16 N/A N/A 1-100 Si (100) 25.4 525 N/A <0.005 N/A N/A N/A N/A 1-100 Si (100) 25.4 525±25 SSP <0.005 N/A N/A N/A N/A 1-100 Si with Oxide layer (100) 25.4 525±25 SSP <0.005 N/A N/A N/A N/A 1-100 Si (100) 25.4 350-500 SSP 1~10 N/A N/A N/A N/A 1-100 Si (100) 25.4 400±25 P/E <0.05 P/ N/A N/A N/A 1-100 Si (100) 50.4 400±25 P/E <0.05 P/ N/A N/A N/A 1-100 p-Si with 90 nm SiO2 (100) 50.4 500±25 P/E <0.05 P/ N/A N/A N/A 1-100 n-Si with 90 nm SiO2 (100) 50.4 500±25 P/E <0.05 N/ N/A N/A N/A 1-100 p-Si with 285 nm SiO2 (100) 50.4 500±25 P/E <0.05 N/ N/A N/A N/A 1-100 n-Si with 285 nm SiO2 (100) 50.4 500±25 P/E <0.05 N/ N/A N/A N/A 1-100 Si with electrodes (100) 50.8 400 N/A <0.05 N/p 1E14-1E15 N/A N/A 1-100 Si (100) 50.8 275 SSP 1~10 N/A N/A N/A N/A 1-100 Si (100) 50.8 275±25 SSP 1~10 N/p N/A N/A N/A 1-100 Si (111) 50.8 350±15 SSP >10000 N/A N/A N/A N/A 1-100 Si (100) 50.8 430±15 SSP 5000-8000 N/A N/A N/A N/A 1-100 Si (111) 50.8 410±15 SSP 1~20 N/A N/A N/A N/A 1-100 Si (111) 50.8 400-500 SSP >5000 N/A N/A N/A N/A 1-100 Si (100) 50.8 525±25 SSP 1~50 N/A N/A N/A N/A 1-100 Si (100) 50.8 500±25 SSP 1~10 N P N/A N/A N/A 1-100 Si (100) 50.8 500±25 P/P >700 P/ N/A N/A N/A 1-100 Si (100) 76.2 400±25 P/E <0.05 P/ N/A N/A N/A 1-100 p-Si with 90 nm SiO2 (100) 76.2 500±25 P/E <0.05 P/ N/A N/A N/A 1-100 n-Si with 90 nm SiO2 (100) 76.2 500±25 P/E <0.05 N/ N/A N/A N/A 1-100 p-Si with 285 nm SiO2 (100) 76.2 500±25 P/E <0.05 N/ N/A N/A N/A 1-100 n-Si with 285 nm SiO2 (100) 76.2 500±25 P/E <0.05 N/ N/A N/A N/A 1-100 Si (100) 100 625 SSP >10000 N/A N/A N/A N/A 1-100 Si (100) 100 525 SSP N/A N/P N/A N/A N/A 1-100 Si (100) 100 320 SSP >2500ohm·cm P/b N/A N/A N/A 1-100 Si (100) 100 N/A SSP 10~30 N/p N/A N/A N/A 1-100 Si (100) 100 505±25 SSP 0.005-0.20 N/P-doped N/A N/A N/A 1-100 Si (100) 100 381 SSP 0.005-0.20 N/P-doped N/A N/A N/A 1-100 Si (100) 100 525 DSP 1-100 N/A N/A N/A N/A 1-100 Si (100) 100 525 DSP 1-100 N/A N/A N/A N/A 1-100 Si (100) 100 625±25 SSP 0.001-0.004 N/A N/A N/A N/A 1-100 Si [...]
Silicon Carbide List 4″ 4H Silicon Carbide Item No. Type Orientation Thickness Grade Micropipe Density Surface Usable area N-Type S4H-100-N-SIC-350-A 4″ 4H-N 0°/4°±0.5° 350±25um A <10/cm2 P/P >90% S4H-100-N-SIC-350-B 4″ 4H-N 0°/4°±0.5° 350±25um B < 30/cm2 P/P >85% S4H-100-N-SIC-350-D 4″ 4H-N 0°/4°±0.5° 350±25um D <100/cm2 P/P >75% S4H-100-N-SIC-370-L 4″ 4H-N 0°/4°±0.5° 370±25um D * L/L >75% S4H-100-N-SIC-440-AC 4″ 4H-N 0°/4°±0.5° 440±25um D * As-cut >75% S4H-100-N-SIC-C0510-AC-D 4″ 4H-N 0°/4°±0.5° 5~10mm D <100/cm2 As-cut * S4H-100-N-SIC-C1015-AC-C 4″ 4H-N 0°/4°±0.5° 5~10mm C <50/cm2 As-cut * 3″ 4H Silicon Carbide Item No. Type Orientation Thickness Grade Micropipe Density Surface Usable area N-Type S4H-76-N-SIC-350-A 3″ 4H-N 0°/4°±0.5° 350±25um A <10/cm2 P/P >90% S4H-76-N-SIC-350-B 3″ 4H-N 0°/4°±0.5° 350±25um B < 30/cm2 P/P >85% S4H-76-N-SIC-350-D 3″ 4H-N 0°/4°±0.5° 350±25um D <100/cm2 P/P >75% S4H-76-N-SIC-370-L 3″ 4H-N 0°/4°±0.5° 370±25um D * L/L >75% S4H-76-N-SIC-410-AC 3″ 4H-N 0°/4°±0.5° 410±25um D * As-cut >75% S4H-76-N-SIC-C0510-AC-D 3″ 4H-N 0°/4°±0.5° 5~10mm D <100/cm2 As-cut * S4H-76-N-SIC-C1015-AC-D 3″ 4H-N 0°/4°±0.5° 10~15mm D <100/cm2 As-cut * S4H-76-N-SIC-C0510-AC-C 3″ 4H-N 0°/4°±0.5° 5~10mm C <50/cm2 As-cut * S4H-76-N-SIC-C1015-AC-C 3″ 4H-N 0°/4°±0.5° 10~15mm C <50/cm2 As-cut * SEMI-INSULATING S4H-76-SI-SIC-350-A 3″ 4H-SI 0°/4°±0.5° 350±25um A <10/cm2 P/P >90% S4H-76-SI-SIC-350-B 3″ 4H-SI 0°/4°±0.5° 350±25um B < 30/cm2 P/P >85% S4H-76-SI-SIC-350-D 3″ 4H-SI 0°/4°±0.5° 350±25um D <100/cm2 P/P >75% 2″ 4H Silicon Carbide Item No. Type Orientation Thickness Grade Micropipe Density Surface Usable area N-Type S4H-51-N-SIC-330-A 2″ 4H-N 0°/4°±0.5° 330±25um A <10/cm2 C/P >90% S4H-51-N-SIC-330-B 2″ 4H-N 0°/4°±0.5° 330±25um B < 30/cm2 C/P >85% S4H-51-N-SIC-330-D 2″ 4H-N 0°/4°±0.5° 330±25um D <100/cm2 C/P >75% S4H-51-N-SIC-370-L 2″ 4H-N 0°/4°±0.5° 370±25um D * L/L >75% S4H-51-N-SIC-410-AC 2″ 4H-N 0°/4°±0.5° 410±25um D * As-cut >75% S4H-51-N-SIC-C0510-AC-D 2″ 4H-N 0°/4°±0.5° 5~10mm D <100/cm2 As-cut * S4H-51-N-SIC-C1015-AC-D 2″ 4H-N 0°/4°±0.5° 10~15mm D <100/cm2 As-cut * S4H-51-N-SIC-C0510-AC-C 2″ 4H-N 0°/4°±0.5° 5~10mm C <50/cm2 As-cut * S4H-51-N-SIC-C1015-AC-C 2″ 4H-N 0°/4°±0.5° 10~15mm C <50/cm2 As-cut * 2″ 6H Silicon Carbide Item No. Type Orientation Thickness Grade Micropipe Density Surface Usable area N-Type S6H-51-N-SIC-330-A 2″ 6H-N 0°/4°±0.5° 330±25um A <10/cm2 C/P >90% S6H-51-N-SIC-330-B 2″ 6H-N 0°/4°±0.5° 330±25um B < 30/cm2 C/P >85% S6H-51-N-SIC-330-D 2″ 6H-N 0°/4°±0.5° 330±25um D <100/cm2 C/P >75% S6H-51-N-SIC-370-L 2″ 6H-N 0°/4°±0.5° 370±25um D * L/L >75% S6H-51-N-SIC-410-AC 2″ 6H-N 0°/4°±0.5° 410±25um D * As-cut >75% S6H-51-N-SIC-C0510-AC-D 2″ 6H-N 0°/4°±0.5° 5~10mm D <100/cm2 As-cut * S6H-51-N-SIC-C1015-AC-D 2″ 6H-N 0°/4°±0.5° 10~15mm D <100/cm2 As-cut * S6H-51-N-SIC-C0510-AC-C 2″ 6H-N 0°/4°±0.5° 5~10mm C <50/cm2 As-cut * S6H-51-N-SIC-C1015-AC-C 2″ 6H-N 0°/4°±0.5° 10~15mm C <50/cm2 As-cut * SEMI-INSULATING S6H-51-SI-SIC-330-A 2″ 6H-SI 0°/4°±0.5° 330±25um A <10/cm2 C/P >90% S6H-51-SI-SIC-330-B 2″ 6H-SI 0°/4°±0.5° 330±25um B < 30/cm2 C/P >85% S6H-51-SI-SIC-330-D 2″ 6H-SI 0°/4°±0.5° 330±25um D <100/cm2 C/P >75% S6H-51-SI-SIC-370-L 2″ 6H-SI 0°/4°±0.5° 370±25um D * L/L >75% S6H-51-SI-SIC-410-AC 2″ 6H-SI 0°/4°±0.5° 410±25um D * As-cut >75% S6H-51-SI-SIC-C0510-AC-D 2″ 6H-SI 0°/4°±0.5° 5~10mm D <100/cm2 As-cut * S6H-51-SI-SIC-C1015-AC-D 2″ 6H-SI 0°/4°±0.5° 10~15mm D <100/cm2 As-cut * Please see below sub-catalogue: 6H n type SiC 4H N Type SiC 4H Semi-insulating SiC SiC Ingots Lapped Wafers Polishing Wafer As a SiC wafer supplier,we offer Silicon carbide list for your reference, if you need price detail, please contact our sales team. Note: *** As manufacturer, we also accept small quantity for researcher or foundry. ***Delivery time: it depends on stock we have, if we have stock, we can ship to you soon.
Lithium Niobate(LNOI) with Metal Electrode There are metal electrode layers (Au, Pt, Al or other metals) between the SiO2 layer and the LN film. An electric field can be applied on the LN film between the metal electrode layer and the top electrode layer. Based on piezoelectric [...]
2018-08-22meta-author
Silicon Wafer with thermal oxidation or Wet and Dry Thermal Oxide (SiO2) are in Stock,oxidation film(SiO2)can be custom In Stock, But Not Limited To The Following. Wafer No.c Wafer Size Polished /oxidation sides Type/Orientation Wafer Thickness(um) oxidation thickness Resistivity(Ohm.cm) Quantity(pcs) PAM-XIAMEN-WAFER-#O01 1″ SSP, both oxidation P100 525±10 300nm <0.005 290 PAM-XIAMEN-WAFER-#O02 2″ SSP, both oxidation P100 500±20 3um 1-10 24 PAM-XIAMEN-WAFER-#O03 2″ DSP, both oxidation N100 285±15 1um 1-10 50 PAM-XIAMEN-WAFER-#O04 2″ SSP, both oxidation P100 430±10 300nm <0.005 5 PAM-XIAMEN-WAFER-#O05 3″ SSP, both oxidation 100 400±10 2um >10000 20 PAM-XIAMEN-WAFER-#O06 4″ SSP, both oxidation 100 400±10 2um >10000 25 PAM-XIAMEN-WAFER-#O07 4″ SSP, both [...]
2019-11-27meta-author
Ge Wafer Substrate-Germanium No. Material Orientation. Diameter Thickness Polish Resistivity Type Dopant Prime flat EPD Ra (mm) (μm) Ω·cm Orientation /cm2 1-100 Ge (100) 50.8 500±25 SSP 0.0138-0.02 P/Ga (110) ≤5000 N/A 1-100 Ge (100) 50.8 500 SSP ≥30 N/undoped N/A N/A <5A 1-100 Ge (100) 50.8 500 SSP 58.4-63.4 N/undoped N/A N/A N/A 1-100 Ge (100) 50.8 500 SSP 0.1-1 P/Ga N/A N/A N/A 1-100 Ge (100) 50.8 500 SSP 0.1-0.05 P/Ga N/A N/A N/A 1-100 Ge (100) 50.8 1000 DSP >30 N/A (110) N/A N/A 1-100 Ge (100) 50.8 2000 SSP N/A N/A N/A N/A N/A 1-100 Ge (100) 50.8 4000 SSP N/A N/A N/A N/A N/A 1-100 Ge (111)/(110) 50.8 200000 N/A 5-20 N/A N/A N/A N/A 1-100 Ge (100) 50.8 400 SSP <0.4 N/A N/A N/A N/A 1-100 Ge (100)/(111) 50.8 4000±10 DSP N/A N/A N/A N/A N/A 1-100 Ge (100) 50.8 350 SSP 1-10 P/Ga (110) ≤5000 N/A PAMP20295 Ge (100) 50.8 500±25 SSP 2-10 P/Ga (110) ≤5000 N/A 1-100 Ge (100) 50.8 500±25 SSP 0.3-3 N/Sb (110) ≤5000 N/A 1-100 Ge (100) 50.8 500±25 SSP 0.3-3 P/Ga (110) ≤5000 N/A 1-100 Ge (111) 60 1000 As cut >30 N/A (110) <3000 N/A 1-100 Ge (100) 100 N/A SSP <0.019 P/Ga (110) <500 N/A 1-100 Ge (100) 100 1000±25 SSP ≥30 N/undoped N/A N/A N/A 1-100 Ge (100) off 6°or off 9° 100 500 SSP 0.01-0.05 P/Ga N/A N/A N/A 1-100 Ge (100) 100 500 SSP 0.01-0.05 P/Ga N/A N/A N/A 1-100 Ge (100) 100 500 DSP 0.01-0.05 P/Ga N/A N/A N/A 1-100 Ge (100) 100 500 SSP <0.01 P/Ga N/A N/A N/A 1-100 Ge (100) 100 500 DSP <0.01 P/Ga N/A N/A N/A 1-100 Ge (100) 100 500 SSP ≥35 P/Ga N/A N/A N/A 1-100 Ge (100) 100 500 DSP ≥35 P/Ga N/A N/A N/A 1-100 Ge (100) 100 500 SSP 0.1-0.05 P/Ga N/A N/A <5A 1-100 Ge (100) 100 500 DSP 0.1-0.05 P/Ga N/A N/A <5A 1-100 Ge (100)6°off (111) 100 185±15 DSP 0.01-0.05 N/A (110) ≤5000 <5A 1-100 Ge (100)6°off (110) 100 525±25 SSP 0.01-0.04 N/A N/A N/A N/A 1-100 Ge (100) 100 N/A N/A N/A N/A N/A N/A N/A 1-100 Ge (100) 100 1000±15 SSP ≥30 N/A (110) ≤5000 N/A 1-100 Ge (100) 100 750±25 SSP ≥30 N/A (110) ≤5000 N/A 1-100 Ge (100) 100 500±25 SSP 10-30 N/A N/A N/A N/A 1-100 Ge (100)/(111) 100 160 DSP 0.05-0.1 P/Ga N/A <500 N/A 1-100 Ge (100)/(111) 100 160 DSP 0.05-0.1 P/Ga N/A <4000 N/A 1-100 Ge (100)/(111) 100 160 DSP 0.05-0.1 N/Sb N/A <500 N/A 1-100 Ge (100)/(111) 100 160 DSP 0.05-0.1 N/Sb N/A <4000 N/A 1-100 Ge (100)/(111) 100 190 DSP 0.05-0.1 P/Ga N/A <500 N/A 1-100 Ge (100)/(111) 100 190 DSP 0.05-0.1 P/Ga N/A <4000 N/A 1-100 Ge (111) 100 500±25 SSP <0.4 N/Sb N/A N/A N/A 1-100 Ge (100)6°off-cut toward(111)A 100 175±25 SSP 0.003-0.009 P/Ga (0-1-1) (0-11) <100 N/A PAM210802 Ge (100) 100 175 DSP <0.02 P N/A N/A N/A 1-100 Ge (310)±0.1° 100 200±15 DSP >20 N/A N/A N/A N/A 1-100 Ge (111) 150 600-700 N/A >30 N/A (110) N/A N/A Germanium wafer list here is for your reference, if you need price detail, please contact our sales team. As a Ge wafer supplier, we also offer bulk Ge wafer with sepecial [...]
SAPPHIRE WAFERS 2 INCH ALUMINUM NITRIDE ALN TEMPLATE ON SAPPHIRE BARIUM FLUORIDE BAF2 CRYSTAL BATIO3 BTO BARIUM TITANATE CRYSTAL SUBSTRATES BGO BISMUTH GERMANATE BI4GE3O12 SCINTILLATION CRYSTAL CRYSTALS GRAPHENE CVD FILMS AND GRAPHENE OXIDE EU DOPED CALCIUM FLUORIDE EU: CAF2 CRYSTAL NON-LINEAR CRYSTAL CA4YO(BO3)3 YCOB CERIUM FLUORIDE CEF3 CRYSTAL CSI CESIUM IODIDE SCINTILLATION CRYSTAL [...]
2019-03-12meta-author
