GaN based LED Epitaxial Wafer

GaN based LED Epitaxial Wafer

PAM-XIAMEN’s GaN(gallium nitride)-based LED epitaxial wafer is for ultra high brightness blue and green light emitting diodes (LED) and laser diodes (LD) application.

  • Description

Product Description

The LED epitaxial wafer is a substrate heated to an appropriate temperature. The LED wafer material is the cornerstone of the technology development for the semiconductor lighting industry. Different substrate materials require different LED epitaxial wafer growth technology, chip processing technology and device packaging technology. The substrate for LED epi wafer determines the development route of semiconductor lighting technology. To achieve luminous efficiency, epitaxial wafer suppliers pay more attention to GaN based LED epitaxial wafer, since the epitaxial wafer price is in low cost, and the epi wafer defect density is small. LED epi wafer advantage on GaN substrate is the realization of high efficiency, large area, single lamp and high power, which make the process technology simplify and improve the large yield rate. The development prospects of the LED epi wafer market are optimistic.

1. LED Wafer List

LED Epitaxial Wafer

Item Size Orientation Emission Wavelength Thickness   Substrate Surface Usable area
 PAM-50-LED-BLUE-F 50mm 0°±0.5° blue light 445-475nm 425um+/-25um Sapphire P/L >90%
 PAM-50-LED-BLUE-PSS 50mm 0°±0.5° blue light 445-475nm 425um+/-25um Sapphire P/L >90%
 PAM-100-LED-BLUE-F 100mm 0°±0.5° blue light 445-475nm / Sapphire P/L >90%
 PAM-100-LED-BLUE-PSS 100mm 0°±0.5° blue light 445-475nm / Sapphire P/L >90%
 PAM-150-LED-BLUE 150mm 0°±0.5° blue light 445-475nm / Sapphire P/L >90%
 PAM-100-LED-BLUE-SIL 50mm 0°±0.5° blue light 445-475nm / Silicon P/L >90%
 PAM-100-LED-BLUE-SIL 100mm 0°±0.5° blue light 445-475nm / Silicon P/L >90%
 PAM-150-LED-BLUE-SIL 150mm 0°±0.5° blue light 445-475nm / Silicon P/L >90%
 PAM-200-LED-BLUE-SIL 200mm 0°±0.5° blue light 445-475nm / Silicon P/L >90%
 PAM-50-LED-GREEN-F 50mm 0°±0.5° green light 510-530nm 425um+/-25um Sapphire P/L >90%
 PAM-50-LED-GREEN-PSS 50mm 0°±0.5° green light 510-530nm 425um+/-25um Sapphire P/L >90%
 PAM-100-LED-GREEN-F 100mm 0°±0.5° green light 510-530nm / Sapphire P/L >90%
 PAM-100-LED-GREEN-PSS 100mm 0°±0.5° green light 510-530nm / Sapphire P/L >90%
 PAM-150-LED-GREEN 150mm 0°±0.5° green light 510-530nm / Sapphire P/L >90%
 PAM-100-LED-RED-GAAS 100mm 15°±0.5° red light 610-630nm / GaAs P/L >90%
 PAM-100-LED-RED-GAAS 100mm 15°±0.5° red light 850nm / GaAs P/L >90%
 PAM-50-LED-UV-365-PSS 50mm 0°±0.5° UVA 365 nm 425um+/-25um Sapphire
 PAM-50-LED-UV-405-PSS 50mm 0°±0.5° UVA 405 nm 425um+/-25um Sapphire
 PAM-50-LED-UVC-275-PSS 50mm 0°±0.5° UVC 275nm 425um+/-25um Sapphire
 PAM-50-LD-BLUE-405-SIL 50mm 0°±0.5° blue light 405nm / Silicon P/L >90%
 PAM-50-LD-BLUE-450-SIL 50mm 0°±0.5° blue light 450nm / Silicon P/L >90%


2. InGaN/
GaN(gallium nitride) based LED Epitaxial Wafer

As a LED epitaxial wafer manufacturer, PAM-XIAMEN can offer activated and unactivated GaN Epi LED wafer for LED and laser diodes (LD) application,such as For micro LED or ultra thin wafer or UV LED researches or LED manufacturers. LED epitaxial wafer on GaN is grown by MOCVD with PSS or flat sapphire for LCD back light, mobile, electronic or UV(ultraviolet), with blue or green or red emission, including InGaN/GaN active area and AlGaN layers with GaN well/AlGaN barrier for different chip sizes.

GaN on Al2O3-2” epi wafer Specification(LED Epitaxial wafer)

White: 445~460 nm
Blue:  465~475 nm
Green: 510~530 nm

1. Growth Technique – MOCVD
2.Wafer diameter: 50.8mm
3.Wafer substrate material: Patterned Sapphire Substrate(Al2O3) or Flat Sapphire
4.Wafer pattern size: 3X2X1.5μm

3. Wafer structure:

Structure layers Thickness(μm)
p-GaN 0.2
p-AlGaN 0.03
InGaN/GaN(active area) 0.2
n-GaN 2.5
u- GaN 3.5
Al2O3 (Substrate) 430

 

4. Wafer parameters to make chips:

em Color Chip Size Characteristics Appearance
PAM1023A01 Blue 10mil x 23mil Lighting
Vf = 2.8~3.4V LCD backlight
Po = 18~25mW Mobile appliances
Wd  = 450~460nm Consumer electronic
PAM454501 Blue 45mil x 45mil Vf = 2.8~3.4V General lighting
Po = 250~300mW LCD backlight
Wd = 450~460nm Outdoor display

 

5. Application of LED epitaixal wafer: 

*If you need to know more detail information of Blue LED Epitaxial Wafer, please contact with our sales departments

Lighting
LCD back light
Mobile appliances
Consumer electronic

6. Specification of LED Epi Wafer as an example:

Spec PAM190730-LED
– size : 4 inch
– WD : 455 ± 10nm
– brightness : > 90mcd
– VF : < 3.3V
– n-GaN Thickness : <4.1㎛
– u-GaN thickness : <2.2㎛
– substrate : patterned sapphire substrate (PSS)

7.GaAs(Gallium arsenide)based LED Wafer Material:

Regarding GaAs LED wafer, they are grown by MOCVD,see below wavelength of GaAs LED wafer:
Red:585nm,615nm,620~630nm
Yellow:587 ~ 592nm
Yellow/Green: 568 ~ 573nm

8. Definition of LED Epitaxial Wafer:

What we offer is bare LED epi wafer or not processed wafer without lithography processes, n- and metals contacts, etc. And you can fabricate the LED chip using your fabrication equipment for different application such as nano optoelectronics research.

 

For these detail GaAs LED wafer specs,please visit:GaAs Epi Wafer for LED

For UV LED wafer specs,please visit:UV LED Epi Wafer  

For LED wafer on silicon specs,please visit:LED Wafer on Silicon 

For Blue GaN LD Wafer specs,please visit: Blue GaN LD Wafer

GaN LED Epi on Sapphire

850nm and 940nm infrared LED wafer

850-880nm and 890-910nm Red Infrared AlGaAs /GaAs LED Epi-Wafer

630nm GaAs LED Wafer

GaN Wafers to Fabricate LED Devices

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