Semi-insulating GaAs (gallium arsenide) crystal with low defects and dopants can be offered by PAM-XIAMEN, one of gallium arsenide producers. Semi-insulating GaAs crystal refers that there is excess arsenic during the GaAs crystal growth process, leading to crystallographic defects, which is arsenic antisite defects. [...]
2021-06-28meta-author
PAM XIAMEN offers GaAs (100) undoped crystal .
GaAs, 10×5,10×10
GaAs , Growing Method: VGF ,(100) undoped Semi-Insulated 10×3 x0.5 mm, 2SP
GaAs , Growing Method: VGF ,(100) undoped Semi-Insulated 10×5 x0.5 mm, 2SP
GaAs (100) orientation, SI (semi-insulating), undoped 5x5x 0.5mm, 1sp,
GaAs [...]
2019-04-22meta-author
PAM-PA03 series are pixel electrode structured detectors based on CZT crystal.
1. CZT Compton Imaging Detector Specification
Material
CdZnTe
Density
5.8g/cm3
Volume resistivity
>1010Ω.cm
Dimension
22.0×22.0 mm2
Thickness
15.0mm
Pixel size
1.38×1.38 mm2
Pixel center space
1.88mm
Pixel array
11×11
Electrode material
Au
Operation temperature
25℃-+40℃
Energy range
60KeV~2.6MeV
Energy resolution(22℃)
Average pixel <5%@662KeV
Storage temperture
10℃~40℃
Storage humidity
20%-80%
2. Spectrum of CZT Compton Imager
3. Features Compton Imaging Detector Based on CZT Crystal
Long-time stability
High energy [...]
2019-04-24meta-author
PAM XIAMEN offers 50.8mm Si wafers.
Please send us email at sales@powerwaywafer.com if you need other specs and quantity.
Item
Material
Orient.
Diam
(mm)
Thck
(μm)
Surf.
Resistivity
Ωcm
Comment
PAM2063
p-type Si:B
[111]
2″
500
P/P
0.003–0.005
Prime, 2 Flats (2nd @ 45°), hard cst
PAM2064
p-type Si:B
[111]
2″
280
P/E
0.001–0.005
SEMI Prime, 1Flat, hard cst
PAM2065
p-type Si:B
[111]
2″
1000
P/E
0.001–0.005
SEMI Prime, 1Flat, hard cst
PAM2066
p-type Si:B
[111]
2″
1000
P/E
0.001–0.005
SEMI Prime, 1Flat, hard cst
PAM2067
p-type Si:B
[111] ±0.5°
2″
500
P/P
<0.01
SEMI Prime, 1Flat, [...]
2019-02-18meta-author
Graphene and carbon nanotube (CNT) structures have promise for many electronic device applications and both have been grown on SiC through the decomposition of the substrate. It is well known that both graphene and aligned CNTs are grown under similar conditions with overlapping temperature [...]
2019-12-16meta-author
Indium phosphide (InP) is one of the III-V compound semiconductors. It is a new generation of electronic functional materials after silicon and gallium arsenide. Indium phosphide semiconductor material has many excellent properties: direct transition band structure, high photoelectric conversion efficiency, high electron mobility, easy [...]
2022-11-29meta-author