GaN baserede LED Epitaksial Wafer

GaN-baseret LED Epitaxial Wafer

PAM-XIAMEN s GaN (galliumnitrid) -baseret LED epitaxial wafer er for ultrahøj lysstyrke blå og grønne lysdioder (LED) og laser dioder (LD) ansøgning.

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The LED epitaxial wafer is a substrate heated to an appropriate temperature. The LED wafer material is the cornerstone of the technology development for the semiconductor lighting industry. Different substrate materials require different LED epitaxial wafer growth technology, chip processing technology and device packaging technology. The substrate for LED epi wafer determines the development route of semiconductor lighting technology. To achieve luminous efficiency, epitaxial wafer suppliers pay more attention to GaN based LED epitaxial wafer, since the epitaxial wafer price is in low cost, and the epi wafer defect density is small. LED epi wafer advantage on GaN substrate is the realization of high efficiency, large area, single lamp and high power, which make the process technology simplify and improve the large yield rate. The development prospects of the LED epi wafer market are optimistic.

1. LED Wafer List

LED Epitaxial Wafer

Vare Size Orientering Emission Wavelength Thickness   Substrate Surface Usable area
 PAM-50-LED-BLUE-F 50mm 0°±0.5° blue light 445-475nm 425um+/-25um Sapphire P/L >90%
 PAM-50-LED-BLUE-PSS 50mm 0°±0.5° blue light 445-475nm 425um+/-25um Sapphire P/L >90%
 PAM-100-LED-BLUE-F 100mm 0°±0.5° blue light 445-475nm / Sapphire P/L >90%
 PAM-100-LED-BLUE-PSS 100mm 0°±0.5° blue light 445-475nm / Sapphire P/L >90%
 PAM-150-LED-BLUE 150mm 0°±0.5° blue light 445-475nm / Sapphire P/L >90%
 PAM-100-LED-BLUE-SIL 50mm 0°±0.5° blue light 445-475nm / Silicon P/L >90%
 PAM-100-LED-BLUE-SIL 100mm 0°±0.5° blue light 445-475nm / Silicon P/L >90%
 PAM-150-LED-BLUE-SIL 150mm 0°±0.5° blue light 445-475nm / Silicon P/L >90%
 PAM-200-LED-BLUE-SIL 200mm 0°±0.5° blue light 445-475nm / Silicon P/L >90%
 PAM-50-LED-GREEN-F 50mm 0°±0.5° green light 510-530nm 425um+/-25um Sapphire P/L >90%
 PAM-50-LED-GREEN-PSS 50mm 0°±0.5° green light 510-530nm 425um+/-25um Sapphire P/L >90%
 PAM-100-LED-GREEN-F 100mm 0°±0.5° green light 510-530nm / Sapphire P/L >90%
 PAM-100-LED-GREEN-PSS 100mm 0°±0.5° green light 510-530nm / Sapphire P/L >90%
 PAM-150-LED-GREEN 150mm 0°±0.5° green light 510-530nm / Sapphire P/L >90%
 PAM-100-LED-RED-GAAS-620 100mm 15°±0.5° red light 610-630nm / GaAs P/L >90%
PAM210527-LED-660 100mm 15°±0.5° red light 660nm / GaAs P/L >90%
 PAM-210414-850nm-LED 100mm 15°±0.5° IR 850nm / GaAs P/L >90%
 PAMP21138-940LED 100mm 15°±0.5° IR 940nm / GaAs P/L >90%
 PAM-50-LED-UV-365-PSS 50mm 0°±0.5° UVA 365 nm 425um+/-25um Sapphire
 PAM-50-LED-UV-405-PSS 50mm 0°±0.5° UVA 405 nm 425um+/-25um Sapphire
 PAM-50-LED-UVC-275-PSS 50mm 0°±0.5° UVC 275nm 425um+/-25um Sapphire
 PAM-50-LD-UV-405-SIL 50mm 0°±0.5° UV 405nm / Silicon P/L >90%
 PAM-50-LD-BLUE-450-SIL 50mm 0°±0.5° blue light 450nm / Silicon P/L >90%


As a LED epitaxial wafer manufacturer, PAM-XIAMEN can offer activated and unactivated GaN Epi LED wafer for LED and laser diodes (LD) application,such as For micro LED or ultra thin wafer or UV LED researches or LED manufacturers. LED epitaxial wafer on GaN is grown by MOCVD with PSS or flat sapphire for LCD back light, mobile, electronic or UV(ultraviolet), with blue or green or red emission, including InGaN/GaN active area and AlGaN layers with GaN well/AlGaN barrier for different chip sizes.

2. InGaN/GAN(gallium nitride) based LED Epitaxial Wafer

GaN på Al2O3-2 ”epi wafer Specification (LED Epitaxial wafer)

Hvid : 445 ~ 460 nm
Blå : 465 ~ 475 nm
Grøn : 510 ~ 530 nm

1. Vækstteknik - MOCVD
2. Skivediameter: 50,8 mm
3. Underlagsmateriale til wafer: mønstret safirunderlag (Al2O3) eller flad safir
4. Skivemønsterstørrelse: 3X2X1,5μm

3. Wafer structure:

Strukturlag Tykkelse (um)
p-GaN 0.2
p-AlGaN 0.03
InGaN / GaN (aktivt område) 0.2
n-gan 2.5
u-GaN 3.5
Al2O3 (underlag) 430

 

4. Wafer parameters to make chips:

em Farve Chip Størrelse Egenskaber Udseende
PAM1023A01 Blå 10m x 23mil Belysning
Vf = 2,8 ~ 3,4 V LCD baggrundsbelysning
Po = 18 ~ 25 mW Mobil apparater
Wd = 450 ~ 460 nm Forbruger elektronisk
PAM454501 Blå 45mil x 45mil Vf = 2,8 ~ 3,4 V Generel belysning
Po = 250 ~ 300 mW LCD baggrundsbelysning
Wd = 450 ~ 460 nm Udendørs display

 

5. Application of LED epitaixal wafer: 

*If you need to know more detail information of Blue LED Epitaxial Wafer, please contact with our sales departments

Belysning
LCD baggrundslys
Mobil apparater
Forbruger elektronisk

6. Specification of LED Epi Wafer as an example:

Spec PAM190730-LED
– size : 4 inch
– WD : 455 ± 10nm
– brightness : > 90mcd
– VF : < 3.3V
– n-GaN Thickness : <4.1㎛
– u-GaN thickness : <2.2㎛
– substrate : patterned sapphire substrate (PSS)

7.GaAs(Gallium arsenide)based LED Wafer Material:

Med hensyn til GaAs LED-skive, dyrkes de af MOCVD, se nedenfor bølgelængde for GaAs LED-skive:
Rød: 585nm, 615nm, 620 ~ 630nm
Yellow:587 ~ 592nm
Yellow/Green: 568 ~ 573nm

8. Definition of LED Epitaxial Wafer:

What we offer is bare LED epi wafer or not processed wafer without lithography processes, n- and metals contacts, etc. And you can fabricate the LED chip using your fabrication equipment for different application such as nano optoelectronics research.

 

Remark:
The Chinese government has announced new limits on the exportation of Gallium materials (such as GaAs, GaN, Ga2O3, GaP, InGaAs, and GaSb) and Germanium materials used to make semiconductor chips. Starting from August 1, 2023, exporting these materials is only allowed if we obtains a license from the Chinese Ministry of Commerce. Hope for your understanding and cooperation!

For disse detaljer GaAs LED wafer specs, kan du besøge:GaAs Epi Wafer til LED

For UV-LED-pladespecifikationer, skal du besøge:UV LED Epi Wafer  

 AlGaN UV LED Wafer

For LED-skive på siliciumspecifikationer skal du besøge:LED Wafer på silicium

For Blue GaN LD Wafer-specifikationer skal du besøge: Blue GaN LD Wafer

For Violet GaN LD Wafer, please visit: 405nm GaN Laser Diode Wafer

GAN LED Epi på Sapphire

850nm and 940nm infrared LED wafer

850-880nm and 890-910nm Red Infrared AlGaAs /GaAs LED Epi-Wafer

630nm GaAs LED Wafer

GaN Wafers to Fabricate LED Devices

GaN LED Structure Epitaxy on Flat or PSS Sapphire Substrate

GaN Epitaxial Growth on Sapphire for LED

Formation of V-Shaped Pits in Nitride Films Grown by Metalorganic Chemical Vapor Deposition

Si-based GaN PIN Photodetector Structure

For more foundry services, please visit: GaN Foundry Services for LED Fabrication

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