Towards the cost effective epitaxy of hillocks free CdZnTe film on (001)GaAs by close-spaced sublimation
Cost-effective epitaxy of hillocks free CdZnTe films on (001)GaAs was explored with close-spaced sublimation (CSS) technique. The orientation and film quality were studied with scanning electron microscopy (SEM), X-ray diffraction θ–2θ and Φ scans [...]
PAM-XIAMEN is an expert of LED wafers, and we offer LED wafers (link: https://www.powerwaywafer.com/gan-wafer/epitaxial-wafer.html) and technology support for you on LED fabrication by our rich experience. Here we share a method of laser for scribing LED wafers. Laser processing is to irradiate a laser [...]
2022-07-08メタ著者
Formation of InAs quantum dots on low-temperature GaAs epi-layer
InAs self-organized quantum dots (QDs) grown on annealed low-temperature GaAs (LT-GaAs) epi-layers and on normal temperature GaAs buffer layers have been compared by transmission electron microscopy (TEM) and photoluminescence (PL) measurements. TEM evidences that self-organized QDs [...]
2014-02-28メタ著者
PAM XIAMEN offers Te-Dy-Fe (Directionally solidified GMM).
Giant magnetostrictive material is an alloy made of terbium, dysprosium and iron by directional solidification. It can change electrical energy into mechanical action or vice versa because of its merit as being sensing and actuating material. Demanding [...]
2019-05-20メタ著者
PAM XIAMEN offers La0.7Sr0.3MnO3 + 100nmPbZr0.2Ti0.8O3 on Nb:SrTiO3 .
20nmLa0.7Sr0.3MnO3 + 100nmPbZr0.2Ti0.8O3 films on Nb:SrTiO3 Substrate <100> 5x5x0.5 mm, 1sp ,wt 0.7%
Specifications:
Film: La0.7Sr0.3MnO3 (20nm) + PbZr0.2Ti0.8O3 (100nm)
Substrate:Nb: SrTiO3 (100), wt 0.7%
Size: 5x5x0.5mm, one side polished
For more information, please visit our website: https://www.powerwaywafer.com,
send us [...]
2019-04-28メタ著者
Light–Output Enhancement of Nano-Roughened GaN Laser Lift-Off Light-Emitting Diodes Formed by ICP Dry Etching
In this paper, we report the fabrication and characteristics of nano-roughened GaN laser lift-off (LLO) light-emitting diodes (LEDs) with different scale surface roughness. The surface roughness of devices was controlled by [...]
2013-03-29メタ著者