We are an expert of semiconductor wafers in semiconductor industry, and we offer technology support and wafers selling for thousands of univerisities and industrial customers by our decades experience, including Cornell University, Stanford Univeristy,Peking University, Shandong Univerity, university of south carolina,Caltech Faraon lab (USA),University of California, Irvine (USA),Singapore MIT Alliance for Research and Technology Centre (SMART),West Virginia University,Purdue Univerity, University of California, Los Angeles,King Abdullah University of Science & Technology,Massachusetts Institute of Technology,University of Houston,University of Wisconsin,University of Science and Technology of China etc. And now we show one article example as follows, who bought our wafers or service: Article title: Frequency Comb Generation From Stimulated Brillouin Scattering and Semiconductor Laser Diodes Published by: (Electrical Engineering) in The [...]
2019-10-31meta-author
PAM XIAMEN offers 4″ FZ Intrinsic Silicon Wafer SSP 4″ FZ (100) intrinsic, SSP wafer Si FZ (100) dia 4’’ x 525µm intrinsic R > 20,000 ohm.cm one side polished with SEMI Std flats Roughness<0.5nm For more information, send us email at sales@powerwaywafer.com and powerwaymaterial@gmail.com
2021-03-17meta-author
PAM XIAMEN offers 3″ Silicon EPI Wafers. Substrate EPI Comment Size Type Res Ωcm Surf. Thick μm Type Res Ωcm 3″Øx381μm n- Si:As[111] 0.001-0.005 P/E 28.5 n- Si:P 4±10% n/n+ 3″Øx381μm n- Si:As[111] 0.001-0.005 P/E 28.5 n- Si:P 20±10% n/n+ 3″Øx381μm n- Si:As[111] 0.001-0.005 P/E 30 n- Si:P 4.5±10% n/n+ 3″Øx355μm n- Si:As[111] 0.001-0.005 P/E 34 n- Si:P 9.5±10% n/n+ 3″Øx355μm n- Si:As[111] 0.001-0.005 P/E 34 n- Si:P 12±10% n/n+ 3″Øx355μm n- Si:As[111] 0.001-0.005 P/E 34 n- Si:P 11±10% n/n+ 3″Øx355μm n- Si:As[111] 0.001-0.005 P/E 36 n- Si:P 4±10% n/n+ 3″Øx381μm n- Si:As[111] 0.001-0.005 P/E 41 n- Si:P 25±10% n/n+ 3″Øx381μm n- Si:As[111] 0.001-0.005 P/E 42 n- Si:P 20.5±10% n/n+ 3″Øx381μm n- Si:As[111] 0.001-0.005 P/E 42.5 n- Si:P 17±10% n/n+ 3″Øx355μm n- Si:As[111] 0.001-0.005 P/E 52.5 n- Si:P 12.5±10% n/n+ 3″Øx381μm n- Si:As[111] 0.001-0.005 P/E 56 n- Si:P 12±10% n/n+ 3″Øx508μm n- Si:As[111] 0.001-0.005 P/E 70 n- Si:P 73±10% n/n+ 3″Øx508μm n- Si:As[111] 0.001-0.005 P/E 72 n- Si:P 12.5±10% n/n+ 3″Øx508μm n- Si:As[111] 0.001-0.005 P/E 73 n- Si:P 84±10% n/n+ 3″Øx508μm n- Si:As[111] 0.001-0.005 P/E 75 n- Si:P 13±10% n/n+ 3″Øx508μm n- Si:As[111] 0.001-0.005 P/E 75 n- Si:P 11±10% n/n+ 3″Øx508μm n- Si:As[111] 0.001-0.005 P/E 80 n- Si:P 12±10% n/n+ 3″Øx375μm n- Si:As[111] 0.001-0.005 P/E 85 n- [...]
2019-03-08meta-author
Epitaxial lift-off process enables the separation of III–V device layers from gallium arsenidesubstrates and has been extensively explored to avoid the high cost of III–V devices by reusing the substrates. Conventional epitaxial lift-off processes require several post-processing steps to restore the substrate to an epi-ready [...]
GLOBAL DEAL TO SLASH TECH TARIFFS GOES INTO FORCE, BUT WITH A HITCH After more than four years of often turbulent negotiations to expand the Information Technology Agreement (ITA), tariffs on roughly $1.3 trillion in trade in tech products finally start marching to zero today. [...]
2016-07-29meta-author
PAM XIAMEN offers LiF Lithium Fluoride Crystal. LiF crystal has excellent VUV region transmittance. It is used for windows, prisms, and lenses in the visible and infrared in 0.104 μm – 7 μm. LiF crystal is sensitive to thermal shock and would be attacked by [...]
2019-03-14meta-author