Wafer Fabrication

PAM-XIAMEN Offers photoresist plate with photoresist and photomask, and provide Nanolithography (photolithography):Surface preparation, Photoresist apply, Soft bake, Alignment, Exposure, Development,Hard bake, Develop inspect, Etch, Photoresist removal(strip), Final inspection.

  • Nanofabrication

    Nanofabrication

    PAM-XIAMEN Offers photoresist plate with photoresist
    We can offer Nanolithography (photolithography):Surface preparation, Photoresist apply, Soft bake, Alignment, Exposure, Development,Hard bake, Develop inspect, Etch, Photoresist removal(strip), Final inspection.

  • Photo Mask

    Photo Mask

    PAM-XIAMEN Offers Photomasks

    A photo mask is a thin coating of masking material supported by a thicker substrate, and the masking material absorbs light to varying degrees and can be patterned with a custom design. The pattern is used to modulate light and transfer the pattern through the process of photolithography which is the fundamental process used to build almost all of today’s digital devices.