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Who We Are

Before 1990, we are stated owned condensed matter physics research center. In 1990, center launched Xiamen Powerway Advanced Material Co., Ltd (PAM-XIAMEN), now it is a leading manufacturer of compound semiconductor material in China. PAM-XIAMEN develops advanced crystal growth and epitaxy technologies, range from the first generation Germanium wafer, second generation Gallium Arsenide with substrate growth and epitaxy on …

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Why Choose Us

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Good Sales Service

Our goal is to meet all of your requirements, no matter how small orders and how difficult questions they may be, to maintain sustained and profitable growth for every customer through our qualified products and satisfying service.
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25+ Years Experiences

With more than 25+years experiences in compound semiconductor material field and export business, our team can assure you that we can understand your requirements and deal with your project professionally.
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Reliable Quality

Quality is our first priority. PAM-XIAMEN has been ISO9001:2008, owns and shares four modern facories which can provide quite a big range of qualified products to meet different needs of our customers, and every order has to be handled through our rigorous quality system. Test report is provided for each shipment, and each wafer are warranty.
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Free And Professional Technology Support

You can get our free technology service from enquiry to after service based on our 25+ experiences in semiconductor line.
After more than 20 years of accumulation and development, our company has an obvious advantage in technology innovation and talent pool.
In the future,We need to speed up the pace of actual action to provide customers with better products and services

Doctor Chan - CEO Of Xiamen Powerway Advanced Material Co., Ltd

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Recent News

GaN Thin Film on Sapphire (Al2O3) Template

Epitaxial GaN template grown on Al2O3 (sapphire) substrate and customizable stacks are available with high quality and low defect [...]

2022-01-19
Growth of GaAsSb / InGaAs Type-II Superlattice

GaAsSb / InGaAs / InP heterostructure is provided by epi-structure MBE grower PAM-XIAMEN for optical sensor fabrication. The gallium [...]

2022-01-18
GaN LED Structure Epitaxy on Flat or PSS Sapphire Substrate

GaN LED structure grown on nano-scale patterned sapphire (Al2O3) substrate can be provided with high efficiency of photoluminescence and [...]

2022-01-06
GaAs based Epi Structure MOCVD Grown for Light Emitter

High quality GaAs based epistructures from PAM-XIAMEN – one of leading epitaxial wafer manufacturers are provided for the research, [...]

2021-12-30
P-Type Doping of Mg in GaN Thin Film Epitaxy on GaN Substrate

P-type GaN thin film epitaxial on GaN substrate is the main technique for developing emitting device. Mg is the [...]

2021-12-23
Nanoscale V-Shaped Pits in InGaN / GaN Multiquantum Wells

GaN-based light-emitting diode (LED) solid-state lighting has become the most important lighting technology in recent years because it has [...]

2021-12-22
Formation of V-Shaped Pits in Nitride Films Grown by Metalorganic Chemical Vapor Deposition

Hyung Koun Cho∗ Department of Metallurgical Engineering, Dong-A University, Busan    604-714 Jeong Yong Lee Department of Materials Science and Engineering, Korea Advanced Institute [...]

2021-12-22
GaAs pHEMT Epi Wafer

PAM-XIAMEN can offer AlGaAs / GaAs p-HEMT (pseudomorphic high electron mobility transistor) heterostructure epitaxial wafer grown by MBE or [...]

2021-12-07
FAQs
Gallium Arsenide wafers, P/P

Q: Please let us know if you could supply below wafer, qty 25/50/300. Gallium Arsenide wafers, P/P 150.00±0.25 mm) 6″Ø×650±25µm, VGF SI undoped GaAs:-[100-2.0°towards[110]]±0.5°, u > 4,000cm²/Vs, Both-sides-polished, 1 Flat 57.5±2.5 mm @ 110±°1, TTV<7µm, BOW<4µm, Warp<10µm, TIR<6µm, Certificate: obligatory, Sealed under nitrogen in single wafer cassette A: Yes, will check the [...]

2018-09-13meta-author
EPD for GaAs Substrate and Epitaxial Wafer

Q: Could you please advise guaranteed EPD for below substrate and epi? Gallium Arsenide wafers, P/E 2″Ø×380±25µm, LEC SI undoped GaAs:-[100]±0.5°, n-type Ro=(0.8E8-0.9E8)Ohmcm, One-side-polished, back-side matte etched, 2 Flats, LT-GaAs EPI: 1-2µm, Resistivity >1E7 Ohm-cm, Carrier lifetime <1ps, Sealed under nitrogen in single wafer cassette. A: Dislocation Density<1×10^6cm-2

2018-09-06meta-author
Gallium Arsenide Wafer, GaAs, VGF, Semi Insulating, Undoped

Q: We would like to ask for below. (001) +/- 0.5o Orientation Semi Insulating, Undoped Resistivity ≤ 1 – 10 x 108 Ohm-cm3 EPD ≤ 5000 cm-2 1 Side Polished (Ra < 10Å), EPI Ready, Back Side Etched US Semi Standard Flats, No Laser [...]

2018-07-17meta-author