Low temperature synthesis of GaN films on ITO substrates by ECR-PEMOCVD
GaN films were deposited on indium tin oxide (ITO) coated glass substrates at various deposition temperatures using an electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition (ECR-PEMOCVD). The TMGa and N2 are applied as precursors of Ga and N, respectively. The crystalline quality and photoluminescence properties of [...]