Improved light output power in GaN-based vertical light-emitting diodes with p-AlInGaN/GaN superlattices
We report the effect of p-type AlGaInN/GaN superlattices (SLs) as electron-blocking layers (EBLs) on the optical properties of vertical light-emitting diodes (VLEDs). Using p-AlGaInN/GaN SLs in VLEDs, we have achieved significant improvements in [...]
2013-04-24meta-author
High quality polycrystalline CdZnTe films were prepared by aluminum induced crystallization (AIC) and radio frequency (r.f.) magnetron sputtering. The crystallinity, morphology and optical property of both as-deposited and AIC samples were investigated by X-ray diffraction (XRD), and atomic force microscopy (AFM), as well as Raman and [...]
Silicon epitaxy with Boron dopant in size 200mm from PAM-XIAMEN is available for semiconductor device fabrication. Silicon epitaxy growth is a surface treatment process for silicon wafers, which means that a single crystal film is superimposed on the polished wafer by chemical reaction or other [...]
2021-06-08meta-author
The development stages of semiconductor wafers are elemental semiconductor, compound semiconductor and wide bandgap semiconductor, as shown in the Fig. 1. Semiconductor wafers can be divided into narrow band gap semiconductors and wide band gap semiconductors according to different band gaps. Wide Band Gap [...]
2019-03-21meta-author
LaAlO3 (Lanthanum Aluminate) substrate is available for. LaAlO3 substrate is commonly used for epitaxial growth of thin films such as high Tc superconductors, magnetic and ferroelectric materials. The dielectric properties of LaAlO3 crystal make it suitable for low loss microwave and dielectric resonance electronics [...]
2019-03-12meta-author
Near-band-edge luminescence in heavily doped gallium arsenide
The near-band-edge photoluminescence at 80K of heavily tellurium-doped degenerate liquid-phase-epitaxial gallium arsenide layers (n=2*1018 cm-3) is investigated. The layers are compensated with shallow germanium acceptors (the values of the degree of compensation are K=0.05-0.7) during the epitaxial growth process. [...]
2018-08-28meta-author