PAM-XIAMEN offers 4H semi-insulating SiC wafer with vanadium doped or undoped high-purity, semi-insulating, size from 2” to 6”. The transmission rate of 4H semi-insulating silicon carbide with thickness of 353 um, double sides polished is shown as the figure: 

Transmission Rate of 4H Semi-insulating SiC Wafer

We also can offer transparent data of SiC substrate, for details please contact at victorchan@powerwaywafer.com.

1. The Price:

PAM-XIAMEN offers the best price on the market for high quality SiC wafers and SiC crystal substrates. Our price matching policy ensures that you get the best price for SiC crystal products with comparable specifications.

2. Custom:

SiC crystal products can be customized to meet the special requirements and specifications of customers. For instance, we provide cutting service to 10mm x 10mm slices, see below example please:

4H semi–insulating SiC, 5mm*5mm, 10mm*10mm with 330μm thickness;

4H semi insulating SiC, 15mm*15mm, 20mm*20mm 330μm thickness;

4H SiC substrate on axis C(0001), 180um+/-25um thickness.

3. Specification of 4H Semi Insulating SiC Substrate:

No.1: 2” 4H Semi-insulating SiC Wafer, C Grade
4H-SI 2″ dia,
Type/ Dopant : Semi-insulating / V or undoped
Orientation : <0001>+/-0.5 degree
Thickness : 330 ± 25 um
C Grade,MPD＜50 cm-2
C Grade,RT:≥1E5 Ω•cm
Double face polished/Si face epi-ready with CMP, Surface Roughness : <0.5 nm

No.2: 2” 4H Semi-insulating SiC Wafer, B Grade
4H-SI 2″ dia,
Type/ Dopant : Semi-insulating / V or undoped
Orientation : <0001>+/-0.5 degree
Thickness : 330 ± 25 um
B Grade,MPD＜15 cm-2
B Grade,RT:≥1E7 Ω•cm
Double face polished/Si face epi-ready with CMP, Surface Roughness : <0.5 nm

No.3: 3” 4H Semi-insulating SiC Wafer, C Grade
4H-SI 3″ dia,
Type/ Dopant : Semi-insulating / V or undoped
Orientation : <0001>+/-0.5 degree
Thickness : 350 ± 25 um
C Grade,MPD＜50 cm-2
C Grade,RT:≥1E5 Ω•cm
Double face polished/Si face epi-ready with CMP, Surface Roughness : <0.5 nm

No.4: 3” 4H Semi-insulating SiC Wafer, B Grade
4H-SI 3″ dia,
Type/ Dopant : Semi-insulating / V or undoped
Orientation : <0001>+/-0.5 degree
Thickness : 350 ± 25 um
C Grade,MPD＜15 cm-2
C Grade,RT:≥1E7 Ω•cm
Double face polished/Si face epi-ready with CMP, Surface Roughness : <0.5 nm

No.5: 4” 4H Semi-insulating SiC Wafer, C Grade
4H-SI 4″ dia,
Type/ Dopant : Semi-insulating / V or undoped
Orientation : <0001>+/-0.5 degree
Thickness : 350 or 500 ± 25 um
C Grade,MPD＜50 cm-2
C Grade,RT:≥1E5 Ω•cm
Double face polished/Si face epi-ready with CMP, Surface Roughness : <0.5 nm

No.6: 4” 4H Semi-insulating SiC Wafer, B Grade
4H-SI 4″ dia,
Type/ Dopant : Semi-insulating / V or undoped
Orientation : <0001>+/-0.5 degree
Thickness : 350 or 500 ± 25 um
C Grade,MPD＜15 cm-2
C Grade,RT:≥1E7 Ω•cm
Double face polished/Si face epi-ready with CMP, Surface Roughness : <0.5 nm

No.7: 6” 4H Semi-insulating SiC Wafer, C Grade
4H-SI 6″ dia,
Type/ Dopant : Semi-insulating / V
Orientation : <0001>+/-0.5 degree
Thickness : 500 ± 25 um
C Grade,MPD＜50 cm-2
C Grade,RT:≥1E5 Ω•cm
Double face polished/Si face epi-ready with CMP, Surface Roughness : <0.5 nm

No.8: 6” 4H Semi-insulating SiC Wafer, B Grade
4H-SI 6″ dia,
Type/ Dopant : Semi-insulating / V or undoped
Orientation : <0001>+/-0.5 degree
Thickness : 500 ± 25 um
C Grade,MPD＜15 cm-2
C Grade,RT:≥1E7 Ω•cm
Double face polished/Si face epi-ready with CMP, Surface Roughness : <0.5 nm

4. Application of 4H Semi-insulating SiC Crystal Substrate and Wafer

Silicon carbide (SiC) crytsals have unique physical and electronic properties. SiC-based devices have been used for short-wavelength photoelectricity, high-temperature, anti-radiation applications. High power and high frequency electronic devices made from semi-insulating silicon carbide substrates are superior to those based on Si and GaAs, and 4H semi-insulating SiC wafers are mainly used in Power device and RF device. Moreover, it can be used as carriers for temporary bonding. For transparent semi-insulated SiC substrate, it has a transparent rate around 70% and is suitable for heat dissipation optics. 

5. FAQ of SiC Wafer

Q1: We would like 170 um thick semi-insulating SiC, would that be possible?

A: It’s no problem to grow 170um thick 4H-SiC semi-insulating at current technology.

Q2: Could you please tell me the difference between the N type and the semi-insulating 4H SiC wafer?

A: The difference is that the resitivity of N type SiC wafer is <1ohm.cm, while that of semi-insulating one is >1E5ohm.cm.

For more information, please contact us email at victorchan@powerwaywafer.com and powerwaymaterial@gmail.com.