Silicon Wafer
Si wafer Substrate -Silicon
Quantity
Material
Orientation.
Diameter
Thickness
Polish
Resistivity
Type Dopant
Nc
Mobility
EPD
PCS
(mm)
(μm)
Ω·cm
a/cm3
cm2/Vs
/cm2
1-100
Si
N/A
25.4
280
SSP
1-100
P/b
N/A
N/A
N/A
1-100
Si
N/A
25.4
280
SSP
1-100
P/b
(1-200)E16
N/A
N/A
1-100
Si
(100)
25.4
525
N/A
<0.005
N/A
N/A
N/A
N/A
1-100
Si
(100)
25.4
525±25
SSP
<0.005
N/A
N/A
N/A
N/A
1-100
Si with Oxide layer
(100)
25.4
525±25
SSP
<0.005
N/A
N/A
N/A
N/A
1-100
Si
(100)
25.4
350-500
SSP
1~10
N/A
N/A
N/A
N/A
1-100
Si
(100)
25.4
400±25
P/E
<0.05
P/
N/A
N/A
N/A
1-100
Si
(100)
50.4
400±25
P/E
<0.05
P/
N/A
N/A
N/A
1-100
p-Si with 90 nm SiO2
(100)
50.4
500±25
P/E
<0.05
P/
N/A
N/A
N/A
1-100
n-Si with 90 nm SiO2
(100)
50.4
500±25
P/E
<0.05
N/
N/A
N/A
N/A
1-100
p-Si with 285 nm SiO2
(100)
50.4
500±25
P/E
<0.05
N/
N/A
N/A
N/A
1-100
n-Si with 285 nm SiO2
(100)
50.4
500±25
P/E
<0.05
N/
N/A
N/A
N/A
1-100
Si with electrodes
(100)
50.8
400
N/A
<0.05
N/p
1E14-1E15
N/A
N/A
1-100
Si
(100)
50.8
275
SSP
1~10
N/A
N/A
N/A
N/A
1-100
Si
(100)
50.8
275±25
SSP
1~10
N/p
N/A
N/A
N/A
1-100
Si
(111)
50.8
350±15
SSP
>10000
N/A
N/A
N/A
N/A
1-100
Si
(100)
50.8
430±15
SSP
5000-8000
N/A
N/A
N/A
N/A
1-100
Si
(111)
50.8
410±15
SSP
1~20
N/A
N/A
N/A
N/A
1-100
Si
(111)
50.8
400-500
SSP
>5000
N/A
N/A
N/A
N/A
1-100
Si
(100)
50.8
525±25
SSP
1~50
N/A
N/A
N/A
N/A
1-100
Si
(100)
50.8
500±25
SSP
1~10
N P
N/A
N/A
N/A
1-100
Si
(100)
50.8
500±25
P/P
>700
P/
N/A
N/A
N/A
1-100
Si
(100)
76.2
400±25
P/E
<0.05
P/
N/A
N/A
N/A
1-100
p-Si with 90 nm SiO2
(100)
76.2
500±25
P/E
<0.05
P/
N/A
N/A
N/A
1-100
n-Si with 90 nm SiO2
(100)
76.2
500±25
P/E
<0.05
N/
N/A
N/A
N/A
1-100
p-Si with 285 nm SiO2
(100)
76.2
500±25
P/E
<0.05
N/
N/A
N/A
N/A
1-100
n-Si with 285 nm SiO2
(100)
76.2
500±25
P/E
<0.05
N/
N/A
N/A
N/A
1-100
Si
(100)
100
625
SSP
>10000
N/A
N/A
N/A
N/A
1-100
Si
(100)
100
525
SSP
N/A
N/P
N/A
N/A
N/A
1-100
Si
(100)
100
320
SSP
>2500ohm·cm
P/b
N/A
N/A
N/A
1-100
Si
(100)
100
N/A
SSP
10~30
N/p
N/A
N/A
N/A
1-100
Si
(100)
100
505±25
SSP
0.005-0.20
N/P-doped
N/A
N/A
N/A
1-100
Si
(100)
100
381
SSP
0.005-0.20
N/P-doped
N/A
N/A
N/A
1-100
Si
(100)
100
525
DSP
1-100
N/A
N/A
N/A
N/A
1-100
Si
(100)
100
525
DSP
1-100
N/A
N/A
N/A
N/A
1-100
Si
(100)
100
625±25
SSP
0.001-0.004
N/A
N/A
N/A
N/A
1-100
Si [...]
The wafer of graphene for sale from PAM-XIAMEN are Monolayer Graphene on PET film, Monolayer Graphene on SiO2/Silicon, Bilayer Graphene on SiO2/Silicon, Monolayer Graphene on Copper, and graphene wafer growth on nickel for researches and industry.
Graphene is a new semiconductor material with a single-layer two-dimensional honeycomb lattice structure piled up by carbon [...]
CZT Semiconductor Wafer
CdZnTe Wafer Substrate-Cadmium Zinc Telluride
Quantity
Material
Orientation.
Size
Thickness
Polish
Resistivity
Type Dopant
FWHM
PCS
(mm)
(μm)
Ω·cm
1-100
CdZnTe
N/A
10×10
1000
DSP
>1E10
N
@59.5keV<7%
1-100
CdZnTe
N/A
10×10
2000
DSP
>1E10
N
@59.5keV<7%
1-100
CdZnTe
(111)
10×10
500
SSP
N/A
P
N/A
1-100
CdZnTe
(211)B
10X10
800
DSP
N/A
N/A
N/A
1-100
CdZnTe
N/A
10X10
500
lapping
N/A
N/A
N/A
1-100
CdZnTe
N/A
10X10
500
DSP
N/A
N/A
N/A
1-100
CdZnTe
N/A
20X20
800
DSP
N/A
N/A
N/A
1-100
CdZnTe
N/A
20×20
5000
DSP
N/A
N/A
N/A
1-100
CdZnTe
N/A
20×20
2000
DSP
N/A
N/A
N/A
1-100
CdZnTe
N/A
20×20
3000
DSP
N/A
N/A
N/A
1-100
CdZnTe
N/A
3X3
2000
DSP
N/A
N/A
N/A
As a CZT semiconductor wafer supplier,we offer CZT semiconductor wafer list for your reference, if you need price detail, please contact our sales team
Note:
*** As manufacturer, we also accept small quantity for researcher or foundry.
***Delivery time: it depends on stock we have, if we have stock, we can ship to you soon.
You can buy silicon epi wafer from PAM-XIAMEN, an epitaxial wafer supplier you want to find, which can offer silicon epi wafer or custom silicon epi wafer. The size we can offer is 2”, 4”, 5”, 6” or 8”. More details please see the wafer list of Si epi wafers [...]
2019-11-27meta-author
Substrates for III-V nitride Film Deposition
Crystal
Structure
M.P.
Density
Lattice Mis-match to GaN
Thermal Expansion
Growth Tech. .& Max size
Standard substrate size (mm)
oC
g/cm3
(10-6/k)
SiC
(6H as example)
Hexagonal
~2700
3.21
3.5 % atori.
10.3
CVD
Ø2″ x 0.3,Ø3″x0.3
a=3.073 Å
20x20x0.3,15x15x0.3
c=15.117 Å
Ø3“
10x10x0.3,5x5x0.3
subl.
1 side epi polished
Al2O3
Hexagonal
2030
3.97
14% atori.
7.5
CZ
Ø50 x 0.33
a=4.758 Å
Ø25 x 0.50
c=12.99 Å
Ø2”
10x10x0.5
1 or 2 sides epi polished
LiAlO2
Tetragonal
1900 ~
2.62
1.4 % atori.
/
CZ
10x10x0.5
a=5.17 Å
Ø20 [...]
2018-07-10meta-author
Lithium Niobate(LN) Thin Film on Insulator
Single crystal Lithium Niobate(LN) films can be integrated on lithium niobate substrate. The structure can be used in electro-optic modulators, optical waveguides, resonators, SAW devices, FRAM memory devices, etc.
Single crystal lithium niobate thin films are of great significance for the development of [...]
2018-08-22meta-author